Polifix PE Series
All Polyethylene type
- Made By All Polyethylene
- High Performance Hollow Fiber Membrane
- Pore size is 5nm, 10nm, 100nm(0.005um, 0.01um, 0.1um)
- Three-dimensional reticulation structure
- Applications: Photoresist,Developer,Thinner,Pure Water, Inorganic Chemical
Enquiry about Polifix PE Series
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| Feature | Benefit |
|---|---|
| Made By All Polyolefin (Polyethylene and Polypropylene) | High Chemical Resistance |
| High Performance Hollow Fiber Membrane | Excellent particle removal performance Long Service Life. Filtration of gelatinous material Filtration of material of high viscosity The dead space is a little. |
| Three-dimensional reticulation structure | Filtration of gelatinous material |
| Made in Japan | High Quality |
Characteristic
Polyfix PE series
Polyethlene Filter series are composed of hollow fiber Polyethlene membrane with all-Polyethylene materials (except an O-ring).
Large filtration area give enhanced high flow rate at low differential pressure drop(dP) with longer filter life and high yield rate.
Special cleaing process is available for reduced total metal ion extractable levels for SEMI grade high purity chemical applications.
Specification
| Disposal Type | |||||||
| Pore Size | 5nm,10nm,0.1um | ||||||
| Material | Filter Media | Polyethylene | |||||
| Housing | Polyethylene | ||||||
| Maximum Operation Pressure | 0.40MPa(25℃） | ||||||
| Allowable maximum differential pressure | 0.25MPa(25℃） | ||||||
| Operation Temperature | 5～40℃ | ||||||
| Connection | 1/4 Swagelok compatible | ||||||
| 1/4″(flowell 60 type compatible) | |||||||
| Cartridge Type | |||||||
| Pore Size | 5nm,10nm,0.1um | ||||||
| Material | Filter Media | Polyethylene | |||||
| Housing | Polyethylene | ||||||
| O-Ring | FKM,Slicon,EPDM,FEP encapsulated FKM | ||||||
| Maximum Operation Pressure | 0.40MPa(25℃） | ||||||
| Allowable maximum differential pressure | 0.25MPa(25℃） | ||||||
| Operation Temperature | 5～40℃ | ||||||
| O-ring size | 2-222,2-226 | ||||||
| Size | 10inch, 20inch | ||||||
Dimentions
Flow rate
Application
Suitable for the filtration of photo resist and developer ,BARC, TARC
Polyimide,Thinner Solvents
High purity chemicals,
UPW/DI water, Alcohol
Organic/inorganic chemicals
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